| abstract |
An object of the present invention is to provide a laminated film having high adhesion and gas barrier properties even in a high-temperature use environment. The laminated film of the present invention has a flexible substrate, an organic layer provided in contact with at least one side of the substrate, and a thin film layer provided in contact with the organic layer, the organic layer contains an acrylate resin, and the film The layer contains Si, O, and C, and the silicon profile, oxygen profile, and carbon profile of the thin film layer all satisfy the following conditions (i) to (iii). (i) The atomic number ratio of Si, the atomic number ratio of O, and the atomic number ratio of C satisfy the following formula (1) in the region of 90% or more in the film thickness direction of the above-mentioned thin film layer, and the atomic number ratio of O>Si (1) (ii) the above-mentioned carbon distribution curve has at least one extreme value, and (iii) the difference between the maximum value and the minimum value of the carbon atomic number ratio in the above-mentioned carbon distribution curve The absolute value is 0.05 or more. |