Predicate |
Object |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02052 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02024 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02021 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1436 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-044 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-24 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
filingDate |
2015-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2020-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2020-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
CN-106663619-B |
titleOfInvention |
Composition for polishing silicon wafer |
abstract |
The invention provides a composition for polishing a silicon wafer, which has excellent performance of reducing haze and low aggregation. The composition for polishing a silicon wafer provided herein comprises an amide group-containing polymer a and an organic compound B containing no amide group. The amide group-containing polymer a has a structural unit S derived from a monomer represented by the following general formula (1) in the main chain. Further, the molecular weight M of the amide group-containing polymer A A With molecular weight M of organic compound B B Satisfies the following equation: m is more than or equal to 200 B <M A 。 |
priorityDate |
2014-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |