http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106662810-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-24 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2015-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2020-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2020-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-106662810-B |
| titleOfInvention | Negative resist composition and multifunctional polymer therein |
| abstract | A negative resist composition comprising a free photoacid generator and a multifunctional polymer covalently bound to a photoacid generator moiety is provided, wherein the composition is substantially free of crosslinking agents. Also provided are multifunctional polymers that can be used in conjunction with resist compositions, and methods of producing resist images on substrates using the compositions and polymers of the present invention. |
| priorityDate | 2014-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 119.