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filingDate 2015-10-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2019-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2019-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-106567053-B
titleOfInvention A method of preparing titanium-aluminium alloy film
abstract The present invention provides a kind of methods for preparing TiAl alloy film, wherein provides reaction chamber, is placed at least one substrate in the reaction chamber;Aluminium predecessor and titanium precursor are introduced into reaction chamber, the aluminium predecessor has the molecular structure of structure formula (I);Make the aluminium predecessor and the titanium precursor and the substrate contact, titanium-aluminium alloy film is formed in the substrate surface by vapor deposition.Method provided by the invention solves the problems, such as step coverage issue of traditional PVD in small size device and not completely filled, using plasma is also avoided simultaneously to assist forming titanium-aluminium alloy film, so that subject plasma does not damage substrate, guarantee that device performance and/or reliability are unaffected.
priorityDate 2015-10-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 43.