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filingDate 2016-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2020-06-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2020-06-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-106505104-B
titleOfInvention FINFET device and method of fabricating the same
abstract Embodiments of the present invention provide a FinFET device that includes a substrate, a fin formed on the substrate, and a gate electrode traversing the fin. The gate electrode includes a head portion and a tail portion, and the tail portion is connected to the head portion and extends toward the substrate. The width of the head portion is greater than the width of the tail portion. Embodiments of the invention also provide another FinFET device and a method for manufacturing a FinFET device.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11784228-B2
priorityDate 2015-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 35.