| abstract |
The present invention relates to resist compositions, particularly resist compositions for use in the production of electronic components by electron beam lithography. In addition to the usual base polymer components (resist polymers), a secondary electron generator is included in the resist composition of the present invention in order to promote secondary electron generation. This unique combination of ingredients increases the exposure sensitivity of the resist in a controlled manner, which facilitates efficient production of high resolution patterned substrates (and corresponding electronic components) but much higher write speeds. |