http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106462021-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F2202-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-185 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-1524 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-568 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1524 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1523 |
| filingDate | 2015-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2021-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2021-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-106462021-B |
| titleOfInvention | Fabrication of Low Defect Rate Electrochromic Devices |
| abstract | Previous electrochromic devices often suffer from higher levels of defectivity issues. The defects can appear as pinholes or spots that can damage the electrochromic transition. This is unacceptable for many applications such as electrochromic architectural glass. Improved electrochromic devices with low defectivity can be fabricated by depositing certain layered components of the electrochromic device in a single integrated deposition system. While these layers are deposited and/or processed on substrates such as glazing, the substrates never leave a controlled ambient environment, such as a low pressure controlled atmosphere with very low levels of particles. These layers can be deposited using physical vapor deposition. In certain embodiments, the device includes a counter electrode having a combination of an anodic-chromic electrochromic material and an additive. |
| priorityDate | 2014-05-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 298.