http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106460197-B
Outgoing Links
Predicate | Object |
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classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-308 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-18 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-308 |
filingDate | 2016-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2019-02-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2019-02-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | CN-106460197-B |
titleOfInvention | Etching solution and etching concentrate for multilayer film, and etching method |
abstract | For an etching solution for etching a multilayer film of a copper layer and a molybdenum layer with one component, the cross-sectional shape of the etched edge is not undercut to form a forward tapered shape, as is the requirement that the etching solution does not contain It is important when used in mass production that precipitates are produced. Etching solutions for multilayer films containing copper layers and molybdenum layers containing hydrogen peroxide, inorganic acids, acidic organic acids, neutral organic acids, amine compounds, and hydrogen peroxide decomposition inhibitors do not contain azole compounds, so they cannot No reactants are generated between hydrogen oxides, and no precipitates are generated in the etching solution. Also, the cross-sectional shape of the etched edge can be formed into a preferred forward tapered shape. Furthermore, since no phosphorus compound or fluorine compound is contained, the environmental load at the time of disposal is also light. |
priorityDate | 2015-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 139.