http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106435528-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45559 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45514 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 |
| filingDate | 2016-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-106435528-B |
| titleOfInvention | chemical vapor deposition equipment |
| abstract | The chemical vapor deposition apparatus disclosed in the present invention includes an air inlet device, and the air inlet device includes: a first reaction gas outlet for delivering the first reaction gas to the substrate to be processed, and a second reaction gas outlet used to deliver the second reaction gas to the substrate to be processed; the isolation device is distributed around the first reaction gas outlet, and the isolation device enables the mixing reaction of the first reaction gas and the second reaction gas to be spatially localized; The two kinds of gas outlets and the isolation device distributed around the first reaction gas outlet together form the smallest periodic structural unit, the equipment includes one periodic structural unit or more than one periodic structural unit; a driving device, which is used to drive the to-be-treated gas outlet substrate or drive the air intake. The invention realizes the spatial localization of the mixed reaction of the two reaction gases through the design of the isolation device, and performs deposition processing on the substrate through the relative motion between the air inlet device and the substrate carrier. |
| priorityDate | 2016-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 59.