http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106406037-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 |
| filingDate | 2016-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2020-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2020-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-106406037-B |
| titleOfInvention | Photoresist developing solution |
| abstract | The photoresist developer provided by the invention comprises a nonionic surfactant with a specific structure and an alkali source, can maintain the developing property of a fine pattern during a developing process, and can reduce the generation of residual shadow and bubbles caused by compound residues. |
| priorityDate | 2015-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 77.