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filingDate 2015-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2020-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2020-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-106340540-B
titleOfInvention Semiconductor element and method for filling pattern
abstract The invention discloses a semiconductor element and a method for filling patterns, wherein the semiconductor element comprises: a substrate, wherein the substrate is provided with a unit area, the unit area comprises a first edge and a second edge, and the first edge and the second edge extend along a first direction; and a plurality of patterns disposed on the substrate and extending along a first direction. The plurality of patterns comprise a plurality of first patterns and a plurality of second patterns, and one of the first patterns closest to the first edge and one of the second patterns closest to the second edge are different patterns.
priorityDate 2015-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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