| abstract |
The invention provides a conductive polymer composition which has excellent antistatic performance when an electron beam resist is inscribed, and has coating performance on the resist and utilization of H 2 O and an alkaline aqueous solution are excellent in releasability and can be suitably used for electron beam lithography. In order to solve the above problems, the present invention provides a conductive polymer composition comprising: (A) a pi-conjugated conductive polymer having at least 1 of repeating units represented by the following general formula (1-1), general formula (1-2), and general formula (1-3); and (B) a doped polymer comprising a repeating unit a represented by the following general formula (2) and having a weight average molecular weight in the range of 1000 to 500000; |