http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106292207-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
| filingDate | 2015-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2021-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2021-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-106292207-B |
| titleOfInvention | Photoresist residue cleaning solution |
| abstract | The invention relates to a photoresist residue cleaning solution, which comprises alcohol amine, quaternary ammonium hydroxide, polyalcohol, hydrazine derivative and solvent. The cleaning solution can effectively remove the photoresist residues on the wafer, basically has no corrosion to the base materials such as copper, aluminum, titanium, tungsten, gold and the like, and has good application prospect in the fields of semiconductor chip cleaning and the like. |
| priorityDate | 2015-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 174.