http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106268737-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_542b85e51dee422645e1e9081755c564 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F101-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F103-30 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J20-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J23-656 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J20-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J20-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J37-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J21-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A01P1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-72 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J20-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A01N59-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J20-10 |
| filingDate | 2015-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e599fb098415ccf081da8a3e626fcc58 |
| publicationDate | 2017-01-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-106268737-A |
| titleOfInvention | A kind of preparation method of the silicon materials of loaded composite photocatalysis agent |
| abstract | The invention discloses the preparation method of the silicon materials of a kind of loaded composite photocatalysis agent, specifically include following steps: (1) pretreatment of raw material；(2) carried titanium dioxide carrier；(3) internal layer solution processed；(4) outer layer solution processed；(5) first impregnation；(6) double-steeping.The present invention first passes through addition strong base solution and silicon materials is carried out heat treatment, and controllability is strong, is conducive to improving the surface energy that silicon materials are too low；The method utilizing Ti3+ assisted Reduction in situ, is evenly distributed in carrier titanium dioxide surface by noble metal nano particles, and load distribution is uniform, interface cohesion is firm, carries out selective light oxidation reaction efficiently；Microwave radiation processing in internal layer solution, mild condition, reaction rate are fast, yield is big；The carbon atom of Graphene links with sp2 hydridization, has good absorbability, the silicon materials obtained load Graphene to pollutant, has higher Stability Analysis of Structures and heat stability, be effectively improved the absorbability of material under temperate condition. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108905498-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108295828-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108295828-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110721747-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112868666-A |
| priorityDate | 2015-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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