Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_36333273e27f0db23ddddbf80ba79ba7 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66795 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7851 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-785 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-0603 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-6656 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-41775 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-41791 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-41783 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-4232 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-6653 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-0684 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-0642 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-78 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66545 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66477 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28247 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-78 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-423 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-06 |
filingDate |
2016-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1ab0b2a1e46431f2dec44975c2ec3887 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e9f30eaf52f74b842ea833e454cde793 |
publicationDate |
2016-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
CN-106252411-A |
titleOfInvention |
The structure of semiconductor device structure and forming method |
abstract |
The invention provides structure and the forming method of semiconductor device structure.Semiconductor device structure includes the gate stack being positioned at semiconductor substrate and is positioned at the protection element above gate stack.The top of protection element is wider than the bottom of protection element.Semiconductor device structure also includes the spacer element above the sidewall of side and the gate stack being positioned at protection element.Semiconductor device structure also includes the conductive contact piece being electrically connected to the conductive component of semiconductor substrate. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109841563-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109841563-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11380542-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10741689-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109285808-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10930785-B2 |
priorityDate |
2015-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |