| abstract |
The present invention provides a photocurable resin composition capable of easily forming a high film thickness and fine pattern when used for pattern formation. For this reason, the present invention provides a kind of photocurable resin composition, and it contains: (A) silicone polymer compound, it has the repeating unit represented by following general formula (1) and (2); (B) A photoacid generator, which is decomposed by light with a wavelength of 190-500nm, and generates an acid; (C) one or more compounds selected from the following compounds: modified by formaldehyde or formaldehyde-alcohols Amino condensates of amino condensates, phenolic compounds having an average of two or more methylol or alkoxymethylol groups in one molecule, and compounds in which the hydroxyl groups of polyhydric phenols are substituted with glycidyloxy groups; and, (D ) is one or more compounds selected from polyhydric phenols having three or more hydroxyl groups. |