http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106226846-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B1-005 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-00 |
| filingDate | 2016-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-106226846-B |
| titleOfInvention | A kind of preparation method of the force-responsive photon crystal material based on reversion imprint nano forming technique |
| abstract | The invention discloses a kind of preparation method of the force-responsive photon crystal material based on reversion imprint nano forming technique, it uses electron beam lithography and reactive ion etching technology, by the photon crystal structure parameter being pre-designed, the rigid template with nanometer scale pattern is etched as caster, to prepare the elastomeric polymer soft template with inverse nanometer scale pattern, and as secondary template；Using high resiliency gel as packing material, viscoelastic polymer as moulding material, by way of inverting impressing, by the pattern " high-fidelity " on caster " replicated " in viscoelastic polymer；And then nanometer scale, the structure-controllable photonic crystal with force-responsive is made.The preparation method of the present invention is relative to prior art, with technique is simple, flow is short, technological parameter is easily controllable, and template is reusable, and Product Precision grade is high, steady quality is reliable, the features such as cost is relatively low. |
| priorityDate | 2016-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 31.