http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106133105-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K3-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K3-22 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-044 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 |
| filingDate | 2015-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2018-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2018-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-106133105-B |
| titleOfInvention | Composition for polishing and use its Ginding process |
| abstract | The present invention provides the composition for polishing for the difference in height that can fully eliminate SiN film.The present invention is a kind of composition for polishing, it is used for the purposes being ground to the grinding object thing for being less than surface positively charged under conditions of 6 in pH, foregoing composition for polishing contains water, abrasive particle and the anionic property copolymer with specific cellular construction, and pH is less than 6, aforementioned anionic copolymer has two or more different acidic-group of acidity. |
| priorityDate | 2014-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 189.