http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106129172-B

Outgoing Links

Predicate Object
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P70-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-50
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-1868
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-18
filingDate 2016-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2017-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2017-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-106129172-B
titleOfInvention A surface passivation method for crystalline silicon solar cells with adjustable charge density
abstract The invention discloses a surface passivation method of crystalline silicon solar cells with adjustable charge density. A quantum well structure composed of metal oxide nano-lamination films is formed on the surface of crystalline silicon solar cells through atomic layer deposition technology. The quantum well nano The stacked layers are tunneling layer, trapping layer and blocking layer in turn; the thickness of the tunneling layer is 2-3nm, and the material is an oxide with a wide band gap; the thickness of the trapping layer is 3-6 nm, and the material is an oxide with a narrow band gap ; The thickness of the blocking layer is 5-10nm, and the material is an oxide with a wide band gap; the electrons are written into the trapping layer, and the writing process requires a positive bias pulse at the electrode end, the voltage range is between 6-15V, and the voltage pulse is between 6-15V Between 100ns‑100ms. The beneficial effect of adopting the technical solution of the present invention is that the charge density in the passivation layer of the solar cell can be adjusted according to the level of the writing voltage and the duration of the pulse, and the density can be between 10 13 ‑10 19 cm ‑2 Arbitrary adjustment between to achieve the optimal passivation effect.
priorityDate 2016-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707785
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24261
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419593465
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID947
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5359268
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID451818717
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707770
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID62157
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID9989226
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID447945359
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707758
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556970
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419491804
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID26042
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559478
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419558591
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419520488
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID62395
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559541
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID447138
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5461123
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID61685
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID292779
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID449913835
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24823
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24374

Total number of triples: 38.