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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336
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filingDate 2016-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2019-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2019-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-106098623-B
titleOfInvention Semiconductor devices and its manufacturing method with high quality epitaxial layer
abstract Disclose semiconductor devices and its manufacturing method with high quality epitaxial layer.According to embodiment, which may include: substrate;The first semiconductor layer of fin-shaped being spaced with substrate, wherein the first semiconductor layer extends along curved longitudinal extension;And the second semiconductor layer at least partially about the first semiconductor layer periphery.
priorityDate 2016-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 23.