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filingDate 2016-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2019-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2019-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-106067442-B
titleOfInvention Cobalt deep etching
abstract The present invention relates to cobalt deep etching. A method of etching cobalt on a substrate is provided. Some methods include exposing the substrate to a boron-containing halide gas and additive, and exposing the substrate to an activating gas and plasma. The additive facilitates the selective deposition of a thicker layer of boron-containing halide material on the surface of the mask than the layer of boron-containing halide material deposited on the surface of the metal. Additives include H 2 , CH 4 , CF 4 , NF 3 , and Cl 2 . Boron-containing halide gases include BCl 3 , BBr 3 , BF 3 , and BI 3 . Exposures may be performed in two or more cycles, where the duration and bias power of each exposure are variable.
priorityDate 2015-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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