http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106054482-B
Outgoing Links
Predicate | Object |
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classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-136295 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-136209 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1362 |
filingDate | 2016-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2019-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2019-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | CN-106054482-B |
titleOfInvention | A kind of array substrate and preparation method thereof and display device |
abstract | The present invention provides a kind of array substrate and preparation method thereof and display device.The preparation method of the array substrate includes: to have the region of alignment mark to form alignment mark coating in the formation of corresponding substrate using patterning processes;The region other than alignment mark forms black matrix film on substrate;Alignment mark coating is removed by exposing, to expose alignment mark;Technique is patterned to black matrix film, to form the figure of black matrix;Wherein, the exposure wavelength of alignment mark coating is different from the exposure wavelength of black matrix film.The black matrix film that the preparation method of the array substrate can be avoided higher optical density (optical density is usually >=4.0) is interfered caused by the identification of alignment mark, crawl and positioning in exposure process, enable black matrix film in exposure by alignment mark exactitude position, to not only increase the exposure accuracy of black matrix, and improve the exposure quality and performance of array substrate. |
priorityDate | 2016-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 17.