http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105887027-B

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classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F2999-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F2009-043
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F9-04
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filingDate 2016-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2018-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2018-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-105887027-B
titleOfInvention A kind of preparation process of molybdenum niobium alloy sputtering target material
abstract The invention belongs to metallurgical material technical fields, and in particular to a kind of preparation process of molybdenum niobium alloy sputtering target material, including powder processed, molding, vacuum-sintering and mechanical processing steps, the powder processed includes the following steps:According to weight ratio it is 6 10 by molybdenum powder and niobium powder:1 ratio is fitted into ball mill, then adition process controlling agent and zirconium oxide balls, carries out ball milling under protection of argon gas, sieving, isolated molybdenum niobium alloy composite powder;The weight of the process control agent and zirconium oxide balls is respectively 0.01 0.05 times, 5 20 times of molybdenum powder and niobium powder total weight;The process control agent is one or more of zinc stearate, palmitic acid, ethyl stearte, polyvinyl alcohol and stearic acid.Gained molybdenum niobium alloy sputtering target material of the invention is single object phase constitution, and even tissue is without hole, and average grain size is 40 65 μm, density >=9.85g/cm 3 , it has excellent performance, the fields such as flat-panel screens can be widely used in.
priorityDate 2016-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 33.