| abstract |
The purpose of the present invention is to provide the gas barrier property with height, and the gas barrier film that resistance to bend(ing) is excellent.The gas barrier film of the present invention is that the gas barrier film with inorganic layer [A] and silicon compound layer [B], silicon compound layer [B] are included at least with SiN successively from above-mentioned polymer base material side in at least side of polymer base material x H y 、SiO p N q 、SiO a (OH) 4‑2a The silicon compound of structure shown in (x+y=4, p+q=4, a ＜ 2x, y, p, q ＞ 0), and inorganic layer [A] connects with silicon compound layer [B]. |