http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105779936-B

Outgoing Links

Predicate Object
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-0021
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-0641
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-325
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-32
filingDate 2016-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2018-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2018-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-105779936-B
titleOfInvention It is a kind of to keep superhard characteristic for super thick TiN film layer while improving the preparation method of toughness
abstract Super thick and the high TiN method of toughness are prepared the invention discloses a kind of, wherein, preparing the TiN film method includes: to be cleaned using the big line metal ion beam of high energy to workpiece using metallic cathode Vacuum Magnetic filter deposition system (FCVA) in workpiece surface;Then metal vacuum steam plasma source method (MEVVA) is used, injects one layer of metal " pinning layer " that can improve film-substrate cohesion in workpiece surface;On the metal " pinning layer ", using Magnetically filtered vacuum arc deposition method (FCVA), deposit to obtain the thick TiN film layer of superhard good toughness carrying out sinusoidal or cosine-modulation to gas inlet amount;Modulation period is repeated until TiN film overall thickness is 10-30 microns.By applying the present invention, there is fine toughness and very high microhardness in workpiece depositing TiN film.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110983283-A
priorityDate 2016-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5352426
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Total number of triples: 24.