| abstract |
The present invention relates to amine precursors of the formula I: (X 1 -R 1 ) n -NH (3-n) (I) or ammonium salts thereof deposited by chemical vapor deposition (CVD) on a substrate S1 having a weight of 0 to 65 The purposes in the graphene film of the nitrogen content of %, wherein R 1 is selected from (a) C 1 to C 10 alkanediyl, it all can be optionally by at least one interval of O, NH and NR , ( b) Alkenediyl , all of which can be optionally interrupted by at least one of O, NH, and NR, (c) alkynediyl , which can all be optionally interrupted by at least one of O, NH, and NR, (d) C 6 to C 20 aromatic divalent moiety, and (e) CO and CH 2 CO, X 1 is selected from H, OH, OR 2 , NH 2 , NHR 2 or NR 2 2 , wherein two groups X 1 may together form a divalent group X2 selected from a chemical bond, O, NH or NR2 , R2 selected from C1 to C10 alkyl and C6 to C20 aromatic moieties, which may optionally be replaced by one or Multiple substituents X 1 are substituted, and n is 1, 2 or 3. |