| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2307-412
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J2207-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J2201-046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2305-026
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2305-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J2205-042
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J2353-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2307-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2607-00 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B5-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B27-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B27-065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/E06B5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J9-26 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/F16L59-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J9-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/E06B5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B27-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B5-18 |
| filingDate |
2014-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2017-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2017-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-105636781-B |
| titleOfInvention |
Thermal isolation film and its manufacture method |
| abstract |
The problem of the present invention, which is to provide, a kind of has high thermal insulation and the thermal isolation film and its manufacture method of high transparency concurrently.The thermal isolation film of the present invention is with plastic foil and forms the polymeric layer with loose structure on the plastic foil.The manufacture method of the thermal isolation film of the present invention includes：(1) process for forming block copolymer layer on the plastic film, (2) process that micro phase separation structure is formed on the block copolymer layer, (3) part or all by a polymer phase of the block copolymer layer for foring micro phase separation structure removes, so as to form the process of the polymeric layer with loose structure. |
| priorityDate |
2013-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |