http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105573058-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1804 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D133-06 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D4-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 2015-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-105573058-B |
| titleOfInvention | Photoresist overcoat compositions |
| abstract | The present invention provides photoresist overcoat compositions. The composition comprises: a matrix polymer, an additive polymer, an alkaline quencher, and an organic solvent. The surface energy of the additive polymer is lower than the surface energy of the matrix polymer, and the additive polymer is present in the overcoat composition in an amount of 1 wt% to 20 wt%, based on the total solids of the overcoat composition. The compositions have particular applicability for use in negative tone development processes in the semiconductor manufacturing industry. |
| priorityDate | 2014-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 237.