http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105518780-B

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1409
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G11B5-8404
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-84
filingDate 2014-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2019-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2019-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-105518780-B
titleOfInvention Silica abrasive grains, the manufacturing method of the silica abrasive grain, and the manufacturing method of the glass substrate for magnetic discs
abstract The present invention provides silica abrasive grains which do not damage an object to be polished and do not reduce the polishing speed. In the silica abrasive grains, the ratio (Si-OH)/Si of the silanol groups (Si-OH) inside the abrasive grains to the silicon element (Si) of the entire abrasive grains (Si-OH)/Si is 0.4 or more.
priorityDate 2013-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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