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filingDate 2014-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2017-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2017-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-105474330-B
titleOfInvention The method that conductive pattern is formed by the direct radiation of electromagnetic wave, and the resin structure with conductive pattern
abstract The present invention provides a kind of method that conductive pattern is formed by the direct radiation of electromagnetic wave, in the case that fluoropolymer resin does not contain specific inorganic additive in itself, methods described also can form fine conductive pattern by simplified technique on various polymeric resin products or resin bed, and the invention further relates to the resin structure formed with conductive pattern thereon.The method of conductive pattern is formed by the direct radiation of electromagnetic wave to be included:By to optionally radiated electromagnetic wave forms the first area with predetermined surface roughness in fluoropolymer resin substrate;Conductive seeds are formed in the fluoropolymer resin substrate;By being electroplated the fluoropolymer resin substrate formed with conductive seeds thereon to form metal level;And the conductive seeds and metal level are removed from the second area of the fluoropolymer resin substrate, wherein, the second area has the surface roughness less than the first area.
priorityDate 2013-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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