http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105448716-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_429245cd41c2f78dfbb5d4075baae975
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82Y40-00
filingDate 2014-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1edfc0c1b19e0c1e6df7d0cebafda23a
publicationDate 2016-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-105448716-A
titleOfInvention Method for manufacturing transistor based on metal nano-dot trench, and prepared product
abstract The invention discloses a method for manufacturing a transistor based on a metal nano-dot trench, and a prepared product. The method can manufacture a trench with a metal nano dot, thereby obtaining a transistor which is prepared without a semiconductor. The method comprises the steps: forming fin-shaped structures on a substrate; forming insulating layers on the surfaces of the fin-shaped structures; filling a gap between the fin-shaped structures with gap filling materials; exposing the tops of the fin-shaped structures; forming a metal nano dot array at the tops of the gap filling materials and the fin-shaped structures; and removing the gap filling materials and the metal nano dots on the gap filling materials, so as to form a structure which is only provided with the metal nano dots at the tops of the fin-shaped structures.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107293586-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107492493-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107293586-A
priorityDate 2014-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 24.