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filingDate 2015-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2018-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2018-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-105406355-B
titleOfInvention The production method of chamber dual wavelength distributed feedback laser altogether
abstract A kind of preparation method of chamber dual wavelength distributed feedback laser altogether, this method comprises the following steps:Step 1:Lower floor's grating is made on doping InP substrate;Step 2:Grating coating and active region layer under epitaxial growth on lower floor's grating;Step 3:Upper strata grating is made on active region layer;Step 4:Epitaxial growth doping indium phosphide cap rock and heavy doping ohmic contact layer on the grating of upper strata;Step 5:Follow-up make is completed by standard laser tube core technique.The bimodulus Distributed Feedback Laser of the present invention compared with prior art, the main distinction are the production method of grating, are the DFB gratings that two sets of different cycles are produced in the lower floor of common chamber active area and upper strata, so as to achieve the effect that while export two DFB wavelength.
priorityDate 2015-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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