http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105372933-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B19-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B19-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29K2909-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B49-02 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B9-065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-3857 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C59-026 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-3842 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
| filingDate | 2015-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2021-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2021-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-105372933-B |
| titleOfInvention | Rectangular substrate for imprint lithography and method of making |
| abstract | A rectangular substrate is prepared by providing a starting rectangular substrate having front and back surfaces to be abraded and four sides, and pressing a rotating polishing pad perpendicularly against one side under constant pressure, and relatively moving the rotating polishing pad and the substrate parallel to the side, thereby polishing the side of the substrate. In imprint lithography, the rectangular base material can control compression and pattern shape with high accuracy, and thus can transfer a complex pattern of fine feature sizes to a receiver. |
| priorityDate | 2014-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 22.