http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105319850-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 2015-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-105319850-B |
| titleOfInvention | Photosensitive polymer combination |
| abstract | The present invention relates to photosensitive polymer combinations.The present invention relates to negative light-sensitive resin combinations, it includes multi-functional thiol's compound (C), Photoepolymerizationinitiater initiater (D) and solvents (E) more than: the 1st resin comprising the repetitive unit indicated by specific structure, the alkali soluble resin (A) comprising the 2nd resin, polymerizable compound (B), 3 functions, the mixed weight ratio of above-mentioned 1st resin and above-mentioned 2nd resin is 50:50~90:10, and the pattern of reactivity and excellent in te pins of durability is thus also capable of forming under low temperature curing conditions. |
| priorityDate | 2014-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 312.