Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c63bc5ef3ae590b0603de4587961cac3 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-26586 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-78 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7841 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B12-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-788 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B41-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B99-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-4236 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-78642 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-78645 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-088 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66477 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B12-0335 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7827 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B12-315 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B12-34 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-788 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8239 |
filingDate |
2015-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_12e1fe32bf99d416c8213b3e2bbf8d20 |
publicationDate |
2016-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
CN-105304724-A |
titleOfInvention |
Semiconductor device including gate electrode |
abstract |
A semiconductor device, comprising: a plurality of first gate electrodes buried in a semiconductor substrate including an active region and a device isolation film; a plurality of junction regions including storage node junction regions and storage node junction regions The bit line junction area; a plurality of storage node contact plugs are respectively placed on the storage node junction area and coupled to the storage node junction area; a plurality of storage nodes are respectively placed on the storage node contact plug and coupled to the storage node junction area a storage node contact plug; and a second gate electrode disposed on a sidewall of a corresponding one of the storage node contact plugs. A vertical transistor includes a second gate electrode and a corresponding storage node contact plug, and stores charges leaked from a corresponding one of the storage nodes. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10861855-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109494192-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109494192-B |
priorityDate |
2014-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |