http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105229098-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1436 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
| filingDate | 2014-05-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-105229098-B |
| titleOfInvention | Comprising N, N, the chemical-mechanical polishing compositions of (2 hydroxypropyl) ethylenediamines of N ＇, N ＇ tetra- or methanesulfonic acid |
| abstract | A kind of chemically mechanical polishing (CMP) composition of present invention description, it includes following components：(A) in the surface modified silicon dioxide particle of scope negative zeta potential with 15mV or below 15mV under 2 to 6 pH value, (B) N, N, N', (2 hydroxypropyl) ethylenediamines of N' tetra- or methanesulfonic acid, (C) water, (D) chooses any one kind of them or various other compositions, and wherein the pH value of composition is in the range of 2 to 6. |
| priorityDate | 2013-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 55.