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filingDate 2014-05-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2017-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2017-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-105229097-B
titleOfInvention Chemical-mechanical polishing compositions comprising polyethyleneimine
abstract A kind of chemically mechanical polishing (CMP) composition of present invention description, it includes following components:(A) there is the surface modified silicon dioxide particle of 15mV or below 15mV negative zeta potential under pH value of the scope between 2 to 6, (B) one or more polyethyleneimines, (C) water, (D) choose any one kind of them or various other compositions, wherein the pH value of composition is in the range of 2 to 6.
priorityDate 2013-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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