http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105093824-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82Y40-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
| filingDate | 2015-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-105093824-B |
| titleOfInvention | A kind of large-area nano imprint lithography method of pneumoelectric collaboration |
| abstract | A kind of large-area nano imprint lithography method of pneumoelectric collaboration, using flexible compound mold as impression block, flexible compound mold has divided several sub-regions by gas circuit.Since side, a sub-regions at edge, with switching of the gas circuit from vacuum to atmospheric pressure, under the action of extra electric field power, the subregion and substrate conformal contact, and being filled up completely for nanoscale structures is realized simultaneously；Successively change gas circuit state, subregion is final to realize nanostructure transfer also successively with substrate contact, present invention is particularly suitable for wafer scale warpage substrates, and stamping and photoetching machine structure is simple, and it is adaptable that variety classes imprint glue, while can meet the manufacture of big depth-to-width ratio nanostructure. |
| priorityDate | 2015-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 19.