http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105093819-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2063 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-20 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-80 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-68 |
| filingDate | 2015-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-105093819-B |
| titleOfInvention | The manufacturing method and photomask base plate of photomask |
| abstract | The present invention provides a kind of manufacturing method of photomask for being capable of forming the high transfer pattern of dimensional accuracy.It includes and prepares the process with resist photomask base plate, in this process, laminated optical film, reflective film and resist film on the transparent substrate；Resist pattern formation process；Form the film etching process of reflective film's pattern；Remove the removing step of above-mentioned resist pattern；Measure the dimension measurement process of the size of above-mentioned reflective film's pattern；Optical film etching work procedure determines the etching period of above-mentioned optical film based on the above-mentioned size measured in this process, carries out the wet etching of above-mentioned optical film using above-mentioned reflective film's pattern as mask based on the etching period of above-mentioned optical film；And removing step removes above-mentioned reflective film in this process, in above-mentioned dimension measurement process, the determination part examination light of Xiang Shangshu reflective film's pattern carries out above-mentioned dimension measurement by detecting the reflected light of above-mentioned inspection light. |
| priorityDate | 2014-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 20.