http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105061490-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-21 |
| filingDate | 2015-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-105061490-B |
| titleOfInvention | A method for reducing impurity content in organosilicon DMC |
| abstract | A method to reduce the impurity content in organosilicon DMC is to use the impurity in organosilicon DMC to be oxidized by peroxide in an alkaline environment, and after the reaction is complete, the two-step process of standing and layering to remove impurities and molecular sieve drying and filtering to remove impurities, Thereby reaching the method for reducing the impurity content in DMC. Practice has proved that the treatment cost of the present invention is low, and the total amount of impurities in DMC can be reduced by more than 60% after treatment, which greatly improves the quality of DMC products and expands its application range. |
| priorityDate | 2015-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 29.