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filingDate 2014-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2019-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2019-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-104937490-B
titleOfInvention Manufacturing method of phase shift mask and phase shift mask
abstract In the phase shift layer forming step, the phase shift layers (11b, 11c, 11d) are formed in multiple stages on the transparent substrate (S) by setting the flow ratio of the oxidizing gas in the atmosphere gas. Then, in the step of forming the phase shift pattern, the phase shift layer is wet-etched to form multi-level regions ( B1bh, B1bi ) in which the thickness variation of the phase shift layer is set to multi-level.
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