http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104900688-B

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filingDate 2014-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2018-05-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2018-05-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-104900688-B
titleOfInvention Orient the heteroj unction bipolar transistor arrangement of epitaxy
abstract A kind of heteroj unction bipolar transistor arrangement for orienting epitaxy, it is direct or indirect grow up on the inclined GaAs substrate in (100) direction (111) B faces, from bottom to top sequentially secondary collector layer, collector layer, base layer, the emitter layer of storehouse on substrate, emitter-base bandgap grading cap rock and ohmic contact layer, wherein emitter layer are more than the III V races semiconductor of base layer for N-type energy gap.In addition, also can further include the tunneling collector layer being clipped between collector layer and base layer, formed by InGaP (InGaP) or indium arsenic phosphide gallium (InGaAsP).The present invention is grown up on the inclined GaAs substrate in (100) direction (111) B faces, and inclined angle is 0.6 °~25 °, can be all easily achievable in general process margins, and indium is made to exist with gallium<111>Side reaches up to very orderly arrangement, reduces base-emitter junction and discontinuous, the enhancement piece electrical characteristic of the tunneling collector junction conductive strips of base stage.
priorityDate 2014-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 39.