| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4303aff2632e06d50d092216115f8d86 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-061
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-083 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3007
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3266
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32412
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3171 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
| filingDate |
2015-01-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0c0a3bdb90644082ae9c565b40b6b428
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0629b29f71f493f6341ec8fa3583a3b4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6c5d2c1f538c19b5b77d3eb7633244de
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_57a7f97a9a3fe6c5bdf312f4986b98a1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e832ffd9adace98de676f11c0b984452 |
| publicationDate |
2015-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-104900470-A |
| titleOfInvention |
Plasma-based material modification using a plasma source with magnetic confinement |
| abstract |
A plasma-based material modification system for material modification of a work piece may include a plasma source chamber coupled to a process chamber. A support structure, configured to support the work piece, may be disposed within the process chamber. The plasma source chamber may include a first plurality of magnets, a second plurality of magnets, and a third plurality of magnets that surround a plasma generation region within the plasma source chamber. The plasma source chamber may be configured to generate a plasma having ions within the plasma generation region. The third plurality of magnets may be configured to confine a majority of electrons of the plasma having energy greater than 10 eV within the plasma generation region while allowing ions from the plasma to pass through the third plurality of magnets into the process chamber for material modification of the work piece. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-116453925-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-116453925-B |
| priorityDate |
2014-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |