http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104851837-B

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classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1617
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1675
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1617
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
filingDate 2015-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2018-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2018-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-104851837-B
titleOfInvention Electroless deposition of continuous platinum layers
abstract The present invention relates to the electroless deposition of continuous platinum layers and in particular provides a method for providing electroless plating of platinum-containing layers. Provides a stable solution of Ti 3+ . Provides Pt 4+ stable solutions. The stream of the Ti 3+ stable solution is mixed with the stream of the Pt 4+ stable solution and water to provide a diluted mixture of the Ti 3+ stable solution and the Pt 4+ stable solution. The substrate was exposed to the diluted mixture of the Ti 3+ stabilizing solution and the Pt 4+ stabilizing solution.
priorityDate 2014-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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