| abstract |
The invention provides a composition comprising a first ethylene-based polymer, formed by a high pressure, free-radical polymerization process, and comprising the following properties: a) relationship between Mw(abs) and I2: Mw(abs)<A*[(12)B], wherein A=5.00*10<2> (kg/mole)/(dg/min)B, and B=-0.40; and b) relationship between MS and I2: MS>=C*[(I2)D], wherein C=13.5 cN/(dg/min)D, and D=-0.55. |