http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104749888-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-405 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16 |
| filingDate | 2014-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-104749888-B |
| titleOfInvention | Photoresist pattern trimming compositions and methods |
| abstract | A photoresist trimming composition includes a base polymer including units formed from monomers of the following general formula (I), wherein R 1 is selected from hydrogen, fluorine, C 1 -C 3 alkyl, and C 1 -C 3 fluoroalkyl, R 2 is selected from C 1 -C 15 alkylene, and R 3 is selected from C 1 -C 3 fluoroalkyl, a non-fluorine-containing aromatic acid, and a solvent |
| priorityDate | 2013-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 107.