http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104718496-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-29 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-29 |
| filingDate | 2013-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-104718496-B |
| titleOfInvention | Manufacturing method of phase shift mask |
| abstract | The manufacturing method of the phase shift mask has the following steps: forming a second mask (RP2) having a predetermined opening pattern so as to cover the surface and the light shielding layer (13) exposed in the pattern opening, and making the surface exposed in the pattern opening cover. The etch stop layer (12) and the phase shift layer (11) are not covered in the light shielding region but are covered in the phase shift region. |
| priorityDate | 2012-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 18.