| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_02cfb0f1aa2718c61bdf184d53adfe79 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2215-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2203-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2201-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2207-80
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2207-70
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2201-42 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B11-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B23-0493
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B19-1415
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B19-1469
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B32-005 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03B8-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03B20-00 |
| filingDate |
2013-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be910ddfb616870fe701e1fde3623bd9 |
| publicationDate |
2015-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-104703929-A |
| titleOfInvention |
Production method for SiO2-TiO2 glass and production method for photomask substrate comprising said glass |
| abstract |
Provided is a production method for SiO2-TiO2 glass in which SiO2-TiO2 glass is produced on a target using a direct method. The production method for SiO2-TiO2 glass includes an ingot growth step in which a SiO2-TiO2 glass ingot of a predetermined length is grown on a target by supplying a silicon compound and a titanium compound to an oxyhydrogen flame and performing flame hydrolysis. The ingot growth step comprises: a first step in which the ratio of the supply amount of the titanium compound to the supply amount of the silicon compound is gradually increased in conjunction with the growth of the SiO2-TiO2 glass ingot until said ratio reaches a predetermined value; and a second step in which, after the ratio has reached the predetermined value at the first step, the SiO2-TiO2 glass ingot is grown while the ratio is kept constant. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109867788-A |
| priorityDate |
2012-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |