http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104614947-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate | 2015-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-104614947-B |
| titleOfInvention | Flexible, stretchable, deformable surface Lithographic template and photolithography method and device |
| abstract | The present invention relates to nanoprocessing field, and photoetching is carried out on complex-curved substrate to realize that (1) system can be realized；(2) etching system uses a template, it is possible to achieve has the photoetching of similar fitgures, these graphic differences are that cycle or spacing are different, the present invention：Flexible, stretchable, deformable curved surface Lithographic template and photolithography method, make stretchable flexible lithography mask plate；Make light source of the flexible UV LED LED panel as exposure；The template of flexible extensible is adhering closely in the substrate for scribbling photoresist in the presence of controllable stress；Flexible LED panel is adhering closely on Flexible formwork assembly；According to appropriate dosage and corresponding time for exposure, LED is opened, photoresist is exposed；Remove flexible LED panel；Remove mask plate；This exposure is completed；Next can be developed and subsequent machining technology.Present invention is mainly applied to the design and manufacture of switched-capacitor integrator. |
| priorityDate | 2015-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 16.