http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104529795-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C211-64 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
| filingDate | 2014-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2016-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2016-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-104529795-B |
| titleOfInvention | A kind of compound for photoetching compositions |
| abstract | The present invention relates to a kind of compound for photoetching compositions, it is applicable to using the excimer laser lithography of ArF, KrF etc., EUV lithography and EB photoetching etc., and it shows outstanding various photoresist material abilities such as susceptibility, sharpness etc., and obtain line edge roughness and the pattern contour of special improvement. |
| priorityDate | 2014-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 177.